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3DMAS tri(dimethylamino)silane

ApplicationMedium temperature deposition SiO in DRAM/NAND2Interlayer insulating film; TOPCon battery ultra-thin tunneling oxide layer (SiO2)Purity>99.9999% (6N)Specification2.41kg/14.2kg/72kg/300kg
Keyword:3DMAS tri(dimethylamino)silane

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Back Surface Passivation Material for Solar Cells

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