DIPAS diisopropylaminosilane

ApplicationIn the process of DRAN and NAND chip manufacturing, used for low-temperature silicon oxide film (ALD-SiO₂) deposition, as the SAPD/SAQP lithography patterned sacrificial layerPurity>99.9999% (6N)Specification13kg/19L

Keyword:DIPAS diisopropylaminosilane

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Silicon precursor

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Focus on the research and development and industrialization of new electronic material precursors, and become the leader of localization of advanced electronic materials.

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