DEMS diethoxy methyl silane

ApplicationUsed for the deposition of silicon carbon oxide film (SiCO:H) in the semiconductor manufacturing processPurity>99.9999% (6N)Specification13.5kg

Keyword:DEMS diethoxy methyl silane

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Silicon precursor

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Focus on the research and development and industrialization of new electronic material precursors, and become the leader of localization of advanced electronic materials.

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