3DMAS tri(dimethylamino)silane

ApplicationMid-temperature deposition SiO in DRAM/NAND₂Interlayer insulating film; ultra-thin tunneling oxide layer (SiO) for TOPCon batteries₂)Purity>99.9999% (6N)Specification2.41kg/14.2kg/72kg/300kg

Keyword:3DMAS tri(dimethylamino)silane

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Silicon precursor

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