Product Center
A new type of electronic materials company that is based on independent research and development, integrating development, production, sales, and service.
PRODUCT
Product classification
Barrier Metal
Semiconductor ALD/CVD precursors are the core key raw materials for semiconductor thin film deposition processes. They can be used to prepare metal/oxide/nitride films through Chemical Vapor Deposition (CVD) and Atomic Layer Deposition (ALD) for integrated circuit manufacturing processes at advanced technology nodes from 90nm to 14nm and even 7nm. They are widely used in high-end chip manufacturing, including logic chips, AI chips, 5G chips, large-capacity memory, and cloud computing chips. Anhui Botai has mastered the production technology of various ALD/CVD precursor materials and has the capability for large-scale production, providing a variety of products including trimethyl aluminum.
Barrier Metal
Focus on the research and development and industrialization of new electronic material precursors, and become the leader of localization of advanced electronic materials.
Contact Us
009 Chaoyang Road, Shitan Industrial Park, Quanjiao County, Chuzhou City, Anhui Province
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